Ion Beam Modification of a Photoresist and Its Application to Field Emitters.

ASANO T; SASAGURI D; SHIBATA E; HIGA K

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J-GLOBAL ID：200902135282740642 Reference number：98A0247991

Ion Beam Modification of a Photoresist and Its Application to Field Emitters.

フォトレジストのイオンビーム改質と電界エミッタへのその応用

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Material：
Volume： 36 Issue： 12B Page： 7749-7753 Publication year： Dec. 1997
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Radiation polymer chemistry , Electron and ion sources , Thermoionic emission and field emission

Reference (12)：

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4) F. Y. Chuang, C. Y. Sun, H. F. Cheng, C. M. Huang and I. N. Lin: Appl. Phys. Lett. 68 (1996) 1666
5) J. S. Abel, H. Mazurek, D. R. Day, E. W. Maby, S. D. Senturia, G. Dresselhaus and M. S. Dresselhaus: Metastable Materials Formation by Ion Implantation, eds. S. T. Picraux and W. J. Choyke (Elsevier, New York, 1982) p. 173.

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