Fast Atom Beam Etching of Glass Materials with Contact and Non-Contact Masks.

TOMA Y; HATAKEYAMA M; ICHIKI K; HUANG H; YAMAUCHI K; WATANABE K; KATO T

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J-GLOBAL ID：200902136768803839 Reference number：98A0247972

Fast Atom Beam Etching of Glass Materials with Contact and Non-Contact Masks.

接触及び非接触マスクを用いたガラス材料の高速原子ビームエッチング

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Author (7)： , , , , , ,
Material：
Volume： 36 Issue： 12B Page： 7655-7659 Publication year： Dec. 1997
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices

Reference (4)：

1) M. Hatakeyama, K. Ichiki, T. Kobata, M. Nakao and Y. Hatamura: IEICE Trans. Electron. E78-C(2) (1995) 174.
2) M. Hatakeyama, S. Tanaka, K. Ichiki, Y. Toma, M. Nakao and Y. Hatamura: Microsys. Technol. 3 (1997) 112.
3) S. Ronggui and G. C. Righini: J. Vac. Sci. Technol. A 9 (1991) 2709
4) Stainbruchel, H. W. Lehmann and K. Frick: J. Electrochem. Soc.: Solid-State Sci. Technol. (1985) 180.

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