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J-GLOBAL ID:200902143715518292   Reference number:93A0461975

Relaxation Mechanism of Thermal Stresses in the Heterostructure of GaN Grown on Sapphire by Vapor Phase Epitaxy.

気相エピタクシーでサファイア上に成長させたGaNのヘテロ構造における熱応力の緩和機構
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Material:
Volume: 32  Issue:Page: 1528-1533  Publication year: Apr. 1993 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Semiconductor thin films  ,  Mechanical properties of solids in general 

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