Art
J-GLOBAL ID：200902145174689261   Reference number：01A0233907

Preparation of boron-doped ZnO thin films by photo-atomic layer deposition.

光原子層堆積によるほう素ドーピングZnO薄膜の作製
Author (4)：
YAMAMOTO Y

About YAMAMOTO Y

(Teikyo Univ. Sci. and Technol., Yamanashi, JPN)

About Teikyo Univ. Sci. and Technol., Yamanashi, JPN

, 
SAITO K

About SAITO K

(Teikyo Univ. Sci. and Technol., Yamanashi, JPN)

About Teikyo Univ. Sci. and Technol., Yamanashi, JPN

, 
TAKAHASHI K

About TAKAHASHI K

(Teikyo Univ. Sci. and Technol., Yamanashi, JPN)

About Teikyo Univ. Sci. and Technol., Yamanashi, JPN

, 
KONAGAI M

About KONAGAI M

(Tokyo Inst. Technol., Tokyo, JPN)

About Tokyo Inst. Technol., Tokyo, JPN


Material：
Solar Energy Materials and Solar Cells  (Sol Energy Mater Sol Cells)

About Solar Energy Materials and Solar Cells


Volume： 65  Issue： 1/4  Page： 125-132  Publication year： Jan. 2001 
JST Material Number： D0513C  ISSN： 0927-0248  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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*atomic layer epitaxy

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,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Techniques and equipment of thin film deposition 
(BK14020I)

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,  Oxide thin films 
(BK14050P)

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Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
原子層堆積

About 原子層堆積

, 
ほう素ドーピング

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, 
ZnO薄膜

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, 
作製

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