Preparation of TiO<sub>2</sub> thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors.

HONBO E; MIYATA M; UENO T; KATO Y; ISHII S

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J-GLOBAL ID：200902147477504569 Reference number：02A0687158

Preparation of TiO₂ thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors.

アーチ磁気ミラーで生成した電子サイクロトロン共鳴プラズマを用いたスパッタリングによるTiO₂薄膜の作製

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Author (5)： , , , ,
Material：
Volume： 66 Issue： 3/4 Page： 263-267 Publication year： Aug. 19, 2002
JST Material Number： E0347A ISSN： 0042-207X Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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Oxide thin films

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Preparation of TiO2 thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors.

Preparation of TiO₂ thin films by sputtering applying electron cyclotron resonance plasma produced in arched magnetic mirrors.