Art
J-GLOBAL ID：200902147508033780
Reference number：00A0751686
Location-Control of Large Si Grains by Dual-Beam Excimer-Laser and Thick Oxide Portion.
二重ビームエキシマレーザと厚い酸化層部分による大型Si粒の位置制御
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Author (3)：
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Material：
Volume：
39
Issue：
7A
Page：
3872-3878
Publication year：
Jul. 15, 2000
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
Thesaurus term：
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
, Laser irradiation effects and damages
Terms in the title (6)：
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