Three-dimensional deposition of TiN film using low frequency(50Hz) plasma chemical vapor deposition.

SHIMOZUMA M; DATE H; IWASAKI T; TAGASHIRA H; YOSHINO M; YOSHIDA K

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J-GLOBAL ID：200902148554423352 Reference number：97A0770861

Three-dimensional deposition of TiN film using low frequency(50Hz) plasma chemical vapor deposition.

低周波数(50Hz)プラズマ化学蒸着を用いたTiNの三次元蒸着

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Author (6)： , , , , ,
Material：
Volume： 15 Issue： 4 Page： 1897-1901 Publication year： Jul. 1997
JST Material Number： C0789B ISSN： 0734-2101 CODEN： JVTAD6 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Thin films of other inorganic compounds

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