Art

J-GLOBAL ID：200902151193865526   Reference number：03A0050128

Preparation and Properties of Bi_4-xLa_xTi₃O₁₂ Ferroelectric Thin Films Using Excimer UV Irradiation.

エキシマUV照射を利用したBi_4-xLa_xTi₃O₁₂強誘電体薄膜の調製と特性

Author (5)： HAYASHI T (Shonan Inst. Technol., Kanagawa, JPN) ,  TOGAWA D (Shonan Inst. Technol., Kanagawa, JPN) ,  YAMADA M (Nagoya Univ., Nagoya, JPN) ,  SAKAMOTO W (Nagoya Univ., Nagoya, JPN) ,  HIRANO S (Nagoya Univ., Nagoya, JPN)
Material： Japanese Journal of Applied Physics. Part 1. Regular Papers, Short Notes & Review Papers  (Japanese Journal of Applied Physics. Part 1. Regular Papers, Brief Communications & Review Papers)
Volume： 41  Issue： 11B  Page： 6814-6819  Publication year： Nov. 30, 2002 
JST Material Number： G0520B  ISSN： 0021-4922  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： bismuth compound ,...

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JST classification (2)： Oxide thin films  (BK14050P) ,  Ferroelectrics,antiferroelectrics and ferroelasticity  (BM05030B)

Reference (9)：

• 1) B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee and W. Jo: Nature 401 (1999) 682.
• 2) Y. Noguchi, I. Miwa, Y. Goshima and M. Miyayama: Jpn. J. Appl. Phys. 39 (2000) L1259.
• 3) Y. Noguchi and M. Miyayama: Appl. Phys. Lett. 78 (2001) 1903.
• 4) H. Uchida, H. Yoshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe and H. Funakubo: Mater. Res. Soc. Symp. Proc. 688 (2002) CC2.3.1.
• 5) E. Tokumitsu, T. Isobe, T. Kijima and H. Ishiwara: Mater. Res. Soc. Symp. Proc. 655 (2001) CC13.9.1.

Terms in the title (4)： エキシマ ,  UV照射 ,  強誘電体薄膜 ,  調製