Art
J-GLOBAL ID：200902161247859107   Reference number：97A0098547

Characterization of thin film produced by quantum dot deposition process.

量子ドット蒸着法で形成した薄膜特性
Author (4)：
AONO S

About AONO S

(Doshisha Univ., Kyoto, JPN)

About Doshisha Univ., Kyoto, JPN

, 
ITOH M

About ITOH M

(Doshisha Univ., Kyoto, JPN)

About Doshisha Univ., Kyoto, JPN

, 
TAKANO H

About TAKANO H

(Doshisha Univ., Kyoto, JPN)

About Doshisha Univ., Kyoto, JPN

, 
TOHNO S

About TOHNO S

(Kyoto Univ., Kyoto, JPN)

About Kyoto Univ., Kyoto, JPN


Material：
Journal of Aerosol Science  (J Aerosol Sci)

About Journal of Aerosol Science


Volume： 27  Issue： Suppl 1  Page： S149-S150  Publication year： Sep. 1996 
JST Material Number： D0776A  ISSN： 0021-8502  Document type： Article
Article type： 短報  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
quantum dot

About quantum dot

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Vapor plating 
(WC08022K)

About Vapor plating

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
量子ドット

About 量子ドット

, 
蒸着

About 蒸着

, 
膜特性

About 膜特性


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