Art
J-GLOBAL ID:200902164684946557   Reference number:01A0489804

Atomic force microscopy observation of layer-by-layer growth of ultrathin silicon dioxide by ozone gas at room temperature.

室温でのオゾンガスによる超薄SiO2の一層ごとの成長の原子間力顕微鏡観察
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Material:
Volume: 19  Issue:Page: 589-592  Publication year: Mar. 2001 
JST Material Number: E0974A  ISSN: 1071-1023  CODEN: JVTBD9  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films  ,  Other noncatalytic reactions 

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