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J-GLOBAL ID:200902170493372623   Reference number:97A0138343

Effects of fluorine addition on the structure and optical properties of SiO2 films formed by plasma-enhanced chemical vapor deposition.

フッ素添加がPECVD-SiO2薄膜の構造および光学特性に及ぼす影響
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Volume: DEI-96  Issue: 132-145  Page: 109-117  Publication year: Dec. 10, 1996 
JST Material Number: Z0908B  Document type: Proceedings
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Semiconductor thin films  ,  Manufacturing technology of solid-state devices 
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