Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi<sub>2</sub> and Nb.

KUROKAWA K; OCHIAI G; TAKAHASHI H; OHTA S; TAKAHASHI H

Art

J-GLOBAL ID：200902171657815668 Reference number：00A0956190

Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi₂ and Nb.

MoSi₂とNbの界面反応に及ぼすスパッタ蒸着した物質(W,Ti,SiC)の効果

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Volume： 59 Issue： 1 Page： 284-291 Publication year： Oct. 2000
JST Material Number： E0347A ISSN： 0042-207X Document type： Article
Article type：原著論文 Country of issue： United Kingdom (GBR) Language： ENGLISH (EN)

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Other noncatalytic reactions , Diffusion in solids in general

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Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi2 and Nb.

Effects of sputter-deposited materials (W, Ti and SiC) on interfacial reaction between MoSi₂ and Nb.