Art
J-GLOBAL ID：200902175729324902
Reference number：01A0700121
In-Diffusion and Annealing Processes of Substitutional Nickel Atoms in Dislocation-Free Silicon.
無転位シリコン中の置換型ニッケル原子の内方拡散とアニール過程
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Author (3)：
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Material：
Volume：
40
Issue：
5A
Page：
3063-3068
Publication year：
May. 15, 2001
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Diffusion in solids in general
Terms in the title (7)：
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