Art
J-GLOBAL ID：200902176284075016
Reference number：02A0322513
Effect of O2 gas partial pressure on mechanical properties of SiO2 films deposited by radio frequency magnetron sputtering.
高周波マグネトロンスパッタリングにより堆積したSiO2膜の機械的性質に及ぼすO2ガス分圧の効果
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Author (3)：
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Material：
Volume：
20
Issue：
2
Page：
356-361
Publication year：
Mar. 2002
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Oxide thin films
, Mechanical properties of solids in general
Terms in the title (6)：
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