Art
J-GLOBAL ID：200902176819806635   Reference number：98A0566728

The Resistance for Anisotropic Etching of Thin Films.

異方性エッチング液に対する薄膜の耐性
Author (3)：
TANAKA TSUNEHISA

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(大阪府産業技総研)

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, 
INOUE KOJI

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(大阪府産業技総研)

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, 
SUZUKI YOSHIHIKO

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(大阪府産業技総研)

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Material：
真空  (Journal of the Vacuum Society of Japan)

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Volume： 41  Issue： 3  Page： 258-261  Publication year： Mar. 1998 
JST Material Number： G0194A  ISSN： 0559-8516  CODEN： SHINA  Document type： Article
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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*metallic thin film

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,...
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Techniques for samples 
(BA02070O)

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,  Metallic thin films 
(BK14030T)

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Reference (2)：
Terms in the title (3)：
Terms in the title
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異方性エッチング

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, 
薄膜

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, 
耐性

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