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J-GLOBAL ID:200902179480925485   Reference number:98A0564669

Surface-recoil processes of hydrogen on Si(1 0 0)-2×1:H and Si(1 0 0)-1×1:2H surfaces studied by low-energy He ion beams.

低速Heイオンビームで調べたSi(100)-2×1:H及びSi(100)-1×1:2H表面上の水素の表面反跳過程
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Volume: 135  Issue: 1/4  Page: 366-371  Publication year: Feb. 1998 
JST Material Number: H0899A  ISSN: 0168-583X  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Interactions with ions  ,  Surface structure of semiconductors 

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