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J-GLOBAL ID：200902179480925485
Reference number：98A0564669
Surface-recoil processes of hydrogen on Si(1 0 0)-2×1:H and Si(1 0 0)-1×1:2H surfaces studied by low-energy He ion beams.
低速Heイオンビームで調べたSi(100)-2×1:H及びSi(100)-1×1:2H表面上の水素の表面反跳過程
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Author (4)：
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Material：
Volume：
135
Issue：
1/4
Page：
366-371
Publication year：
Feb. 1998
JST Material Number：
H0899A
ISSN：
0168-583X
Document type：
Article
Article type：
原著論文
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Interactions with ions
, Surface structure of semiconductors
Terms in the title (7)：
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