Improvement in partitioning method for electron beam lithography simulation.

AYA S; HIFUMI T; KISE K; MARUMOTO K

Art

J-GLOBAL ID：200902183501030413 Reference number：02A0329839

Improvement in partitioning method for electron beam lithography simulation.

電子ビームリソグラフィーシミュレーション用の分割法の改善

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Author (4)： , , ,
Material：
Volume： 20 Issue： 1 Page： 90-94 Publication year： Jan. 2002
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Applications of electron beams and ion beams

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