Measurements of the Depth Profile of the Refractive Indices in Oxide Films on SiC by Spectroscopic Ellipsometry.

IIDA T; TOMIOKA Y; YOSHIMOTO K; MIDORIKAWA M; TUKADA H; YOSHIKAWA M; ITOH H; ISHIDA Y; YOSHIDA S

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J-GLOBAL ID：200902185129060087 Reference number：02A0278791

Measurements of the Depth Profile of the Refractive Indices in Oxide Films on SiC by Spectroscopic Ellipsometry.

SiC上酸化膜の屈折率の深さプロフィルの分光偏光解析法による測定

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Material：
Volume： 41 Issue： 2A Page： 800-804 Publication year： Feb. 15, 2002
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Oxide thin films , Refractometry and reflectometry and their equipments , Polarimetry and polarimeters

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