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J-GLOBAL ID:200902185201966908   Reference number:00A0658809

Post hydrogenation of sputtered amorphous silicon by pressurized water boiling.

スパッタリングによるアモルファスシリコンの高圧下の水中煮沸による後水素化
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Material:
Volume: 266/269  Issue: Pt.A  Page: 146-149  Publication year: May. 2000 
JST Material Number: D0642A  ISSN: 0022-3093  Document type: Article
Article type: 原著論文  Country of issue: Netherlands (NLD)  Language: ENGLISH (EN)
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Semiconductor thin films 

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