Art
J-GLOBAL ID:200902185478702886   Reference number:00A0921702

Photoreflectance characterization of the plasma-induced damage in Si substrate.

Si基板のプラズマ誘起損傷のフォトリフレクタンスによる評価
Author (6):
Material:
Volume: 88  Issue:Page: 2336-2341  Publication year: Sep. 01, 2000 
JST Material Number: C0266A  ISSN: 0021-8979  CODEN: JAPIAU  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=00A0921702&from=J-GLOBAL&jstjournalNo=C0266A") }}
JST classification (2):
JST classification
Category name(code) classified by JST.
Irradiational changes semiconductors  ,  Other optical effects 

Return to Previous Page