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J-GLOBAL ID:200902188445932885   Reference number:00A0912466

Determination of Donor Densities and Donor Levels in 3C-SiC Grown from Si2(CH3)6 Using Hall-Effect Measurements.

Si2(CH3)6から成長させた3C-SiCにおけるドナー密度とドナー準位のHall効果測定による決定
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Volume: 39  Issue: 9A  Page: 5069-5075  Publication year: Sep. 15, 2000 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Lattice defects in semiconductors  ,  Electronic structure of impurites and defects 
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