Art
J-GLOBAL ID:200902195362952074   Reference number:99A0245545

Proximity Effect Correction by Pattern Modified Stencil Mask in Large-Field Projection Electron Beam Lithography.

大フィールド描画電子ビームリソグラフィーにおけるパターン修正ステンシルマスクによる近接効果補正
Author (5):
Material:
Volume: 37  Issue: 12B  Page: 6767-6773  Publication year: Dec. 1998 
JST Material Number: G0520B  ISSN: 0021-4922  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
Thesaurus term:
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
,...
   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=99A0245545&from=J-GLOBAL&jstjournalNo=G0520B") }}
JST classification (1):
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
Reference (17):
more...

Return to Previous Page