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J-GLOBAL ID：200902197059181840
Reference number：01A0088205
Control of Plasma Parameters for High-Quality Hydrogenated Amorphous Carbon Growth.
高品質の水素化非晶質炭素の成長のためのプラズマパラメータの制御
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Author (5)：
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Material：
Volume：
39
Issue：
11
Page：
6427-6431
Publication year：
Nov. 15, 2000
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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Semiconductor thin films
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Reference (23)：
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1) B. Bhushan: Tribology and Mechanics of Magnetic Storage Devices, ed. B. Bhushan (Springer, New York, 1996) 2nd ed. Chap. 8, p. 632.
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2) K. Azuma, H. Shirai and T. Kochi: Thin Solid Films 296 (1997) 72.
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3) S. Logothetidis, G. Stergioudis and N. Vouroutzis: Surf. & Coat. Technol. <B>100–101</B> (1998) 486.
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4) K. Azuma, H. Inaba, K. Tasaka and H. Shirai: submitted to Jpn. J. Appl. Phys.
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5) P. Koidl, Ch. Wild, B. Dischler, J. Wagner and M. Ramsteiner: Mater. Sci. Forum <B>52&53</B> (1989) 41.
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