Art

J-GLOBAL ID：200902203590788643   Reference number：06A0447785

Surface reactions during etching of organic low-k films by plasmas of N2 and H2

N₂及びH₂プラズマによる有機低k膜のエッチング中の表面反応

Author (7)： ISHIKAWA Kenji (Inst. of Fluid Sci., Tohoku Univ., 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, JPN) ,  YAMAOKA Yoshikazu (Assoc. of Super-advanced Electronics Technol. (ASET), 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0198, JPN) ,  NAKAMURA Moritaka (Assoc. of Super-advanced Electronics Technol. (ASET), 3-1 Morinosato-Wakamiya, Atsugi-shi, Kanagawa 243-0198, JPN) ,  YAMAZAKI Yuichi (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), AIST TC 2-13, 1-1-1 Umezono ...) ,  YAMASAKI Satoshi (Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol. (AIST), AIST TC 2-13, 1-1-1 Umezono ...) ,  ISHIKAWA Yasushi (Inst. of Fluid Sci., Tohoku Univ., 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, JPN) ,  SAMUKAWA Seiji (Inst. of Fluid Sci., Tohoku Univ., 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, JPN)
Material： Journal of Applied Physics  (Journal of General Physics and its Application to Other Sciences and to Industry)
Volume： 99  Issue： 8  Page： 083305-083305-6  Publication year： Apr. 15, 2006 
JST Material Number： C0266A  ISSN： 0021-8979  CODEN： JAPIAU  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： organic compound ,...
Semi thesaurus term： surface modification

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JST classification (2)： Thin films of organic compounds  (BK14070L) ,  Solid-gos interface in general.  (CB12041H)

Terms in the title (5)： N2 ,  H2 ,  プラズマ ,  エッチング ,  表面反応