Art
J-GLOBAL ID：200902205357375323
Reference number：07A0078105
Dielectric Constants on Mixture Thin Films of Barium Carbide and Barium Nitrate Deposited on Silicon Wafers by Barium Carbonate Electron Beam Evaporation Using Nitrogen Molecular and Ion Beams
窒素分子およびイオンビームを用いた炭酸バリウム電子ビーム蒸着によりシリコンウエハ上に蒸着した炭化バリウムと硝酸バリウムとの混合薄膜に関する誘電定数
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Author (2)：
,
Material：
Volume：
45
Issue：
12
Page：
9129-9136
Publication year：
Dec. 15, 2006
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Thin films of other inorganic compounds
, Dielectrics in general
Reference (24)：
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The International Technology Roadmap for Semiconductors, 2004 Update, http://public.itrs.net Update/Home.
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D. S. Gardner, J. D. Meindle and K. C. Saraswat: IEEE Trans. Electron Devices 34(1987)633.
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M. Borhr and Y. A. Elmansy: IEEE Trans. Electron Devices 45(1998)620.
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S. Beaudoin, S. Graham, R. Jaiswal, C. Kilroy, B. S. Kim, G. Kumar and S. Smith: Interface 14(2005)35.
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Joint Committee for Powder Diffraction Standards, Powder Diffraction File (Int. Center for Diffraction Data, Park Lane, 1989) No.3-0468.
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