Two-dimensional void growth during thermal decomposition of thin HfO<sub>2</sub> films on Si

MIYATA Noriyuki; MORITA Yukinori; HORIKAWA Tsuyoshi; NABATAME Toshihide; ICHIKAWA Masakazu; TORIUMI Akira

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J-GLOBAL ID：200902213612683161 Reference number：05A0750431

Two-dimensional void growth during thermal decomposition of thin HfO₂ films on Si

Si上でHfO₂薄膜が熱分解するとき2次元ボイド成長

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Author (6)： , , , , ,
Material：
Volume： 71 Issue： 23 Page： 233302.1-233302.4 Publication year： Jun. 2005
JST Material Number： D0746A ISSN： 1098-0121 CODEN： PRBMDO Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films

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Two-dimensional void growth during thermal decomposition of thin HfO2 films on Si

Two-dimensional void growth during thermal decomposition of thin HfO₂ films on Si