Art

J-GLOBAL ID：200902215892637618   Reference number：06A0098371

A simple lithographic method employing 172 nm vacuum ultraviolet light to prepare positive- and negative-tone poly(methyl methacrylate) patterns

ポジ及びネガ調のポリメタクリル酸メチルパターン作製用の172nm真空紫外光を採用した簡単なリソグラフィー法

Author (4)： ASAKURA S. (Graduate School of Sci. and Engineering, Waseda Univ., 3-4-1, Okubo, Shinjuku-ku, Tokyo 169-8555, JPN) ,  HOZUMI A. (National Inst. of Advanced Industrial Sci. and Technol. (AIST), 2266-98, Anagahora, Shimo-shidami, Moriyama-ku ...) ,  YAMAGUCHI T. (Graduate School of Sci. and Engineering, Waseda Univ., 3-4-1, Okubo, Shinjuku-ku, Tokyo 169-8555, JPN) ,  FUWA A. (Graduate School of Sci. and Engineering, Waseda Univ., 3-4-1, Okubo, Shinjuku-ku, Tokyo 169-8555, JPN)
Material： Thin Solid Films
Volume： 500  Issue： 1-2  Page： 237-240  Publication year： Apr. 03, 2006 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *Polymethyl Methacrylate ,...
Semi thesaurus term： photocrosslinking ,...

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JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Substance index (1)： Toluene

Terms in the title (5)： ネガ ,  ポリメタクリル酸メチル ,  作製 ,  採用 ,  リソグラフィー