Art

J-GLOBAL ID：200902220163704406   Reference number：06A0256566

Surface characterization of ion-enhanced implanted photoresist removal

イオン増強注入されたフォトレジスト除去の表面特性評価

Author (5)： KAWAGUCHI Mark N. (Applied Materials, Inc., 974 East Arques Avenue, Sunnyvale, California 94085) ,  PAPANU James S. (Applied Materials, Inc., 974 East Arques Avenue, Sunnyvale, California 94085) ,  SU Bo (Applied Materials, Inc., 974 East Arques Avenue, Sunnyvale, California 94085) ,  CASTLE Matthew (Applied Materials, Inc., 974 East Arques Avenue, Sunnyvale, California 94085) ,  AL-BAYATI Amir (Applied Materials, Inc., 974 East Arques Avenue, Sunnyvale, California 94085)
Material： Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)
Volume： 24  Issue： 2  Page： 657-663  Publication year： Mar. 2006 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： *photoresist ,...
Semi thesaurus term： *plasma treatment

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JST classification (2)： Manufacturing technology of solid-state devices  (NC03030V) ,  Applications of plasma  (BJ02110K)

Terms in the title (6)： イオン ,  増強 ,  注入 ,  フォトレジスト ,  表面特性 ,  評価