Art
J-GLOBAL ID:200902221352293243   Reference number:06A0474534

High-Rate Growth of Large Diamond by Microwave Plasma Chemical Vapor Deposition with Newly Designed Substrate Holders

新規設計した基板ホルダを活用したマイクロ波プラズマ化学気相成長法による大型ダイヤモンドの迅速成長法
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Material:
Volume: 16  Issue:Page: 63-69  Publication year: 2006 
JST Material Number: L1952A  ISSN: 1344-9931  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: ENGLISH (EN)
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Thesaurus term/Semi thesaurus term
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Category name(code) classified by JST.
Carbon and its compounds  ,  Semiconductor thin films 

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