Patterning of ZnS-SiO<sub>2</sub> by Laser Irradiation and Wet Etching

MIURA Hiroshi; TOYOSHIMA Nobuaki; HAYASHI Yoshitaka; SANGU Suguru; IWATA Noriyuki; TAKAHASHI Junnichi

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J-GLOBAL ID：200902221573559280 Reference number：06A0288956

Patterning of ZnS-SiO₂ by Laser Irradiation and Wet Etching

レーザ照射とウエットエッチングによりZnS-SiO₂のパターニング

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Material：
Volume： 45 Issue： 2B Page： 1410-1413 Publication year： Feb. 28, 2006
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Electronic recording,magnetic recording,optical recording , Memory units , Applications of lasers , Manufacturing technology of solid-state devices

Reference (7)：

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David V. Tsu and T. Ohta: Tech. Dig. ISOM, 2004, We-F-06, p. 80.
H. Miura, Y. Hayashi, S. Fujita, K. Ujiie and K. Yokomori: Proc. SPIE 4090(2000)102.
A. Kouchiyama, K. Aratani, Y. Takemoto, T. Nakao, S. Kai, K. Osato and K. Nakagawa: Jpn. J. Appl. Phys.42(2003)769.

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Patterning of ZnS-SiO2 by Laser Irradiation and Wet Etching

Patterning of ZnS-SiO₂ by Laser Irradiation and Wet Etching