Art
J-GLOBAL ID:200902223166394326   Reference number:06A0138891

Fabrication and characterization of vertical-type double-gate metal-oxide-semiconductor field-effect transistor with ultrathin Si channel and self-aligned source and drain

超薄膜Siチャンネルおよび自己整合したソースとドレインを持つ縦型2重ゲート金属-酸化物-半導体電界効果トランジスターの作製と評価
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Material:
Volume: 88  Issue:Page: 072103-072103-3  Publication year: Feb. 13, 2006 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Transistors 

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