Art
J-GLOBAL ID：200902224662222388   Reference number：08A0865784

Characteristics improvement of HfO2/Ge gate stack structure by fluorine treatment of germanium surface

HfO2/Geゲートスタック構造のゲルマニウム表面のフッ素処理による特性改善
Author (4)：
LEE Hyun

About LEE Hyun

(Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN)

About Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN

, 
LEE Dong Hun

About LEE Dong Hun

(Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN)

About Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN

, 
KANASHIMA Takeshi

About KANASHIMA Takeshi

(Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN)

About Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN

, 
OKUYAMA Masanori

About OKUYAMA Masanori

(Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN)

About Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka, 560-5831, JPN


Material：
Applied Surface Science  (Appl Surf Sci)

About Applied Surface Science


Volume： 254  Issue： 21  Page： 6932-6936  Publication year： Aug. 30, 2008 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*hafnium oxide

About hafnium oxide

, 
insulating film

About insulating film

, 
*germanium

About germanium

, 
*fluorination

About fluorination

, 
*MIS structure

About MIS structure

, 
MOCVD

About MOCVD

, 
state density

About state density

, 
interface(surface)

About interface(surface)

, 
X-ray photoelectron spectrum

About X-ray photoelectron spectrum

, 
depth profile

About depth profile

, 
capacitance-voltage characteristic

About capacitance-voltage characteristic

, 
gate dielectric film

About gate dielectric film


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
*photo-MOCVD

About photo-MOCVD


JST classification (2)：
JST classification
Category name(code) classified by JST.
Metal-insulator-semiconductor structures 
(BM03085X)

About Metal-insulator-semiconductor structures

,  Oxide thin films 
(BK14050P)

About Oxide thin films

Terms in the title (6)：
Terms in the title
Keywords automatically extracted from the title.
HfO2

About HfO2

, 
Ge

About Ge

, 
ゲートスタック

About ゲートスタック

, 
ゲルマニウム

About ゲルマニウム

, 
フッ素処理

About フッ素処理

, 
特性改善

About 特性改善


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