Art
J-GLOBAL ID：200902232506996163   Reference number：04A0501014

Electron channeling X-ray microanalysis for site occupation in β-FeSi2 doped with Co

Coをドープしたβ-FeSi2の格子位置占有に対する電子チャネリングX線微小解析
Author (2)：
MORIMURA T

About MORIMURA T

(Nagasaki Univ., Nagasaki, JPN)

About Nagasaki Univ., Nagasaki, JPN

, 
HASAKA M

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(Nagasaki Univ., Nagasaki, JPN)

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Material：
Materials Characterization  (Mater Charact)

About Materials Characterization


Volume： 52  Issue： 1  Page： 35-41  Publication year： Mar. 2004 
JST Material Number： D0448C  ISSN： 1044-5803  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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*iron base alloy

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,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
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ALCHEMI法

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JST classification (1)：
JST classification
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Lattice defects in metals 
(BK12030F)

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Terms in the title (7)：
Terms in the title
Keywords automatically extracted from the title.
CO

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, 
ドープ

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, 
格子

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, 
電子チャネリング

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, 
X線

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, 
微小

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, 
解析

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