Crystal-Face Dependences of Surface Band Edges and Hole Reactivity, Revealed by Preparation of Essentially Atomically Smooth and Stable (110) and (100) n-TiO<sub>2</sub> (Rutile) Surfaces

NAKAMURA R; OHASHI N; IMANISHI A; OSAWA T; MATSUMOTO Y; KOINUMA H; NAKATO Y

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J-GLOBAL ID：200902242065276904 Reference number：05A0210346

Crystal-Face Dependences of Surface Band Edges and Hole Reactivity, Revealed by Preparation of Essentially Atomically Smooth and Stable (110) and (100) n-TiO₂ (Rutile) Surfaces

本質的,原子的に平滑で安定な(110)及び(100)n-TiO₂(ルチル)面の調製によって明らかにされた,表面バンド端及びホール反応性の結晶面依存性

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Material：
Volume： 109 Issue： 5 Page： 1648-1651 Publication year： Feb. 10, 2005
JST Material Number： W0921A ISSN： 1520-6106 CODEN： JPCBFK Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Bases,metal oxides , Other physical chemistry in general , Photochemistry in general , Surface structure of solids in general

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Crystal-Face Dependences of Surface Band Edges and Hole Reactivity, Revealed by Preparation of Essentially Atomically Smooth and Stable (110) and (100) n-TiO2 (Rutile) Surfaces

Crystal-Face Dependences of Surface Band Edges and Hole Reactivity, Revealed by Preparation of Essentially Atomically Smooth and Stable (110) and (100) n-TiO₂ (Rutile) Surfaces