Fabrication of trilayer resist using photocuring-imprint lithography

KIM S H; HIROSHIMA H; INOUE S; KURASHIMA Y; KOMURO M

Art

J-GLOBAL ID：200902246110416629 Reference number：04A0098350

Fabrication of trilayer resist using photocuring-imprint lithography

光橋かけ-インプリントリソグラフィーによる三層レジストの作製

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Author (5)： , , , ,
Material：
Volume： 21 Issue： 6 Page： 3144-3148 Publication year： Nov. 2003
JST Material Number： E0974A ISSN： 1071-1023 CODEN： JVTBD9 Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Other reactions of polymer

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