Art

J-GLOBAL ID：200902250007427431   Reference number：07A1193240

Lens System Adjustment in Semiconductor Lithography Equipment (Optimization for Lens Groups Rotation)

半導体露光装置におけるレンズ調整(群回し調整の最適化)

Author (4)： SHINANO YUJI (東京農工大 大学院共生科学技術研究部) ,  FUKAGAWA YOZO (キヤノン) ,  TAKANO YOSHIMI (キヤノン) ,  YOSHIHARA TOSHIYUKI (キヤノン)
Material： 日本機械学会論文集 C編  (Transactions of the Japan Society of Mechanical Engineers. Series C)
Volume： 73  Issue： 735  Page： 2982-2987  Publication year： Nov. 25, 2007 
JST Material Number： F0045B  ISSN： 0387-5024  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)

Thesaurus term： *semiconductor ,...
Semi thesaurus term： exposure equipment

   To see more with JDream III (charged).   {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=07A1193240&from=J-GLOBAL&jstjournalNo=F0045B") }}

JST classification (1)： Cameras and their accessories  (QF05030V)

Reference (6)：

• OKAZAKI, S. Semiconductor Lithography Technology for Beginners. 2003, 43-69
• FUKAGAWA, Y. Optimum Adjustment for Distortion in Semiconductor Lithography Equipment. Transactions of the Japan Society of Mechanical Engineers. 2006, 72, 722, 308-312
• YOSHIHARA, T. Realization of Very Small Aberration Projection Lenses. Optical Microlithography. 2000, XIII, 559-566
• TAKAHASHI, T. From Abberation Coefficient to Automatic Design. 1994, 208-209
• JOHNSON, E. L. Progress in Linear Programming-Based Algorithms for Integer Programming : An Exposition. INFORMS Journal on Computing. 2000, 12, 1, 2-23

Terms in the title (4)： 露光装置 ,  レンズ ,  群 ,  最適化