Art
J-GLOBAL ID：200902252105714190   Reference number：05A0681421

Photovoltaic Characteristics of a-C:H Films Prepared on p-Si by Plasma CVD

プラズマCVD法でp-Si面に形成したa-C:H薄膜の光起電力特性
Author (3)：
AKASAKA Hiroki

About AKASAKA Hiroki

(Tokyo Inst. Technol., Tokyo, JPN)

About Tokyo Inst. Technol., Tokyo, JPN

, 
AOKI Yuichi

About AOKI Yuichi

(Tokyo Inst. Technol., Tokyo, JPN)

About Tokyo Inst. Technol., Tokyo, JPN

, 
OHTAKE Naoto

About OHTAKE Naoto

(Tokyo Inst. Technol., Tokyo, JPN)

About Tokyo Inst. Technol., Tokyo, JPN


Material：
New Diamond and Frontier Carbon Technology  (New Diam Front Carbon Technol)

About New Diamond and Frontier Carbon Technology


Volume： 15  Issue： 3  Page： 151-157  Publication year： 2005 
JST Material Number： L1952A  ISSN： 1344-9931  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
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photocell

About photocell

,...
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Solar cell 
(NC03084O)

About Solar cell

,  Batteries in general 
(YB04010O)

About Batteries in general

,  Carbon and its compounds 
(YB02060D)

About Carbon and its compounds

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
プラズマCVD法

About プラズマCVD法

, 
Si

About Si

, 
薄膜

About 薄膜

, 
光起電力

About 光起電力


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