Art
J-GLOBAL ID：200902256261217879   Reference number：04A0021156

Localized deposition by μ-jet-CVD

μジェットCVDによる局所蒸着
Author (2)：
HOLLAENDER A

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(Fraunhofer-Inst. fuer Angewandte Polymerforsch., Golm, DEU)

About Fraunhofer-Inst. fuer Angewandte Polymerforsch., Golm, DEU

, 
ABHINANDAN L

About ABHINANDAN L

(Center for Advanced Technol., Indore, IND)

About Center for Advanced Technol., Indore, IND


Material：
Surface & Coatings Technology  (Surf Coat Technol)

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Volume： 174/175  Page： 1175-1177  Publication year： Sep. 2003 
JST Material Number： D0205C  ISSN： 0257-8972  Document type： Article
Article type： 解説  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)
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*chemical vapor deposition

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,...
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JST classification (1)：
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Applications of plasma 
(BJ02110K)

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Substance index (2)：
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Hexamethyldisiloxane

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, 
Acetylene

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Terms in the title (3)：
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ジェット

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, 
CVD

About CVD

, 
蒸着

About 蒸着


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