Nanometer-scale crystallization of thin HfO<sub>2</sub> films studied by HF-chemical etching

FUJII Shinji; MIYATA Noriyuki; MIGITA Shinji; HORIKAWA Tsuyoshi; TORIUMI Akira; TORIUMI Akira

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J-GLOBAL ID：200902275080458810 Reference number：05A0581634

Nanometer-scale crystallization of thin HfO₂ films studied by HF-chemical etching

HF化学エッチングにより調べたHfO₂薄膜のナノメータスケールでの結晶化

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Author (6)： , , , , ,
Material：
Volume： 86 Issue： 21 Page： 212907.1-212907.3 Publication year： May. 23, 2005
JST Material Number： H0613A ISSN： 0003-6951 CODEN： APPLAB Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Oxide thin films

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Nanometer-scale crystallization of thin HfO2 films studied by HF-chemical etching

Nanometer-scale crystallization of thin HfO₂ films studied by HF-chemical etching