Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography

KIM S H; HIROSHIMA H; INOUE S; KURASHIMA Y; KOMURO M

Art

J-GLOBAL ID：200902279597479430 Reference number：04A0543851

Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography

フォトナノインプリントリソグラフィーにおけるドライエッチングでの光硬化ポリマのパターン収縮率と粗さの減少

Publisher site Copy service {{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=04A0543851&COPY=1") }}
Access JDreamⅢ for advanced search and analysis. {{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0543851&from=J-GLOBAL&jstjournalNo=G0520B") }}

Author (5)： , , , ,
Material：
Volume： 43 Issue： 6B Page： 4022-4026 Publication year： Jun. 30, 2004
JST Material Number： G0520B ISSN： 0021-4922 Document type： Article
Article type：原著論文 Country of issue： Japan (JPN) Language： ENGLISH (EN)

,...

To see more with JDream III (charged). {{ this.onShowAbsJLink("http://jdream3.com/lp/jglobal/index.html?docNo=04A0543851&from=J-GLOBAL&jstjournalNo=G0520B") }}

Manufacturing technology of solid-state devices

Reference (16)：

1) S. Y. Chou, P. R. Krauss and P. J. Renstrom: J. Vac. Sci. & Technol. B 14 (1996) 4129.
2) J. Haisma, M. Verheijen, K. van den Heuvel and J. van den Berg: J. Vac. Sci. & Technol. B 14 (1996) 4124.
3) M. Colburn, A. Grot, B. J. Choi, A. Amistoso, T. Bailey, S. V. Sreenivassen, J. G. Ekerdt and C. G. Willson: J. Vac. Sci. & Technol. B 19 (2001) 2162.
4) M. Komuro, J. Taniguchi, S. Inoue, N. Kimura, Y. Tokano, H. Hiroshima and S. Matsui: Jpn. J. Appl. Phys. 39 (2000) 7075.
5) P. Ruchhoeft, M. Colburn, B. Choi, H. Nounu, S. Johnson, T. Bailey, S. Damle, M. Stewart, J. Ekerdt, S. V. Sreenivasan, J. C. Wolfe and C. G. Willson: J. Vac. Sci. & Technol. B 17 (1999) 2965.

ｍore...

, , , , , ,

Return to Previous Page