New Aqueous-base Soluble Resin and Its Applicationto Negative and Positive Tone EB Resists for Mask-making

SHIRAISHI H; MIGITAKA S; ARAI T; HATTORI T; FUKUDA H

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J-GLOBAL ID：200902282311295907 Reference number：04A0512713

New Aqueous-base Soluble Resin and Its Applicationto Negative and Positive Tone EB Resists for Mask-making

新しい水溶性樹脂とそのマスク製造用のネガ及びポジ型EBレジストへの利用

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Author (5)： , , , ,
Material：
Volume： 17 Issue： 4 Page： 575-580 Publication year： 2004
JST Material Number： L0202A ISSN： 0914-9244 CODEN： JSTEEW Document type： Article
Article type：解説 Country of issue： Japan (JPN) Language： ENGLISH (EN)

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Manufacturing technology of solid-state devices , Polycondensation , Aromatic monocyclic phenols and polyphenols

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Reference (6)：

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2. S. H. Pine, J. B. Hendrickson, D. J. Cram, G. S. Hammond, "Organic Chemistry", 4th ed., Chapter 13.
3. A. Zampini, P. Turci, G. J. Cernigliaro, H. F. Sandford, G. J. Swanson, C. C. Meister, and R. Sinta, Proc. SPIE, 1262 (1990) 501.
4. (a) K. Kojima, S. Uchino, N. Asai, T. Ueno, Chem. Mater., 8 (1996) 2433.
(b) S. Uchino, J. Yamamoto, S. Migitaka, K. Kojima, M. Hashimoto, F. Murai, and H. Shiraishi, J. Photopolym. Sci. Technol., 11 (1998) 555.

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