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J-GLOBAL ID:200902287154368077   Reference number:05A0501835

Electron impact effects on the oxidation of Si(111) at 90 K

90KにおけるSi(111)の酸化に対する電子衝撃の効果
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Volume: 23  Issue:Page: 475-479  Publication year: May. 2005 
JST Material Number: C0789B  ISSN: 0734-2101  CODEN: JVTAD6  Document type: Article
Article type: 原著論文  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Oxide thin films  ,  Other noncatalytic reactions  ,  Irradiational changes of other materials 
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