Art
J-GLOBAL ID：200902287154368077
Reference number：05A0501835
Electron impact effects on the oxidation of Si(111) at 90 K
90KにおけるSi(111)の酸化に対する電子衝撃の効果
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Author (2)：
,
Material：
Volume：
23
Issue：
3
Page：
475-479
Publication year：
May. 2005
JST Material Number：
C0789B
ISSN：
0734-2101
CODEN：
JVTAD6
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
Thesaurus term：
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Oxide thin films
, Other noncatalytic reactions
, Irradiational changes of other materials
Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
,
,
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