About TAKADA Akira
About Topcon Corp., Tokyo, JPN
About SHIBUYA Masato
About Tokyo Polytechnic Univ.
About Proceedings of SPIE
About photomask
About defect
About flaw inspection
About sensitivity(ratio)
About ability
About polarized light
About birefringence
About lithography
About simulation
About electromagnetic field analysis
About mask pattern
About detectivity
About Numerical Simulation
About Manufacturing technology of solid-state devices
About 偏光
About 変化検出
About マスク
About 欠陥検査