Art

J-GLOBAL ID：201002263711463104   Reference number：10A0533482

Nanostructure of WO₃ Sputtered Films Deposited at Various Gas Pressures

種々の気体圧で堆積したWO₃スパッター膜のナノ構造

Author (4)： SHAALAN Nagih M. (Graduate School of Sci. and Engineering, Univ. of Toyama) ,  YAMAZAKI Toshinari (Graduate School of Sci. and Engineering, Univ. of Toyama) ,  KIKUTA Toshio (Graduate School of Sci. and Engineering, Univ. of Toyama) ,  KAWABATA Tokimasa (Graduate School of Sci. and Engineering, Univ. of Toyama)
Material： Journal of the Vacuum Society of Japan  (真空)
Volume： 53  Issue： 3  Page： 210-213 (J-STAGE)  Publication year： 2010 
JST Material Number： G0194A  ISSN： 1882-2398  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： ENGLISH (EN)

Thesaurus term： *tungsten oxide ,  *sputtered deposition ,  evaporated film ,  pressure effect ,  microcrystal ,  *heat treatment ,  *crystallization ,  monoclinic system ,  surface area ,  nanostructure
Semi thesaurus term： pressure dependence

JST classification (1)： Oxide thin films  (BK14050P)

Reference (11)：

• 1) J. A. Thornton: J. Vac. Sci. Technol. A, 4 (1986) 3059.
• 2) J. A. Thornton: J. Vac. Sci. Technol., 12 (1975) 830.
• 3) J. A. Thornton: J. Vac. Sci. Technol., 11 (1974) 666.
• 4) T. Yamazaki, H. Okumura, C.J. Jin, A. Nakayama, T. Kikuta and N. Nakatani: Vacuum, 77 (2005) 237.
• 5) T. Yamazaki, T. Furuta, Y. Shen, C. Jin, T. Kikuta and N. Nakatani: Jpn. J. Appl. Phys., 45 (2006) 9180.

Terms in the title (4)： 気体圧 ,  堆積 ,  スパッター膜 ,  ナノ構造