Art

J-GLOBAL ID：201002272877686054   Reference number：10A0117854

Effect of the radio-frequency power on the dielectric properties of hydrogen-containing boron carbon nitride films deposited by plasma-assisted chemical vapor deposition using tris(dimethylamino)boron gas

トリス(ジメチルアミノ)ホウ素ガスを用いてプラズマ支援化学蒸着によって堆積した水素含有窒化ホウ素炭素膜の誘電特性に及ぼす高周波電力の効果

Author (6)： AOKI Hidemitsu (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN) ,  MASUZUMI Takuro (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN) ,  HARA Makoto (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN) ,  WATANABE Daisuke (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN) ,  KIMURA Chiharu (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN) ,  SUGINO Takashi (Dep. of Electrical, Electronic and Information Engineering, Osaka Univ., 2-l Yamadaoka, Suita, Osaka 565-0871, JPN)
Material： Thin Solid Films
Volume： 518  Issue： 8  Page： 2102-2104  Publication year： Feb. 01, 2010 
JST Material Number： B0899A  ISSN： 0040-6090  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： carbon compound ,  boron compound ,  *nitride ,  hydride ,  *plasma CVD ,  dielectric thin film ,  *permittivity ,  thermal desorption spectrum ,  Fourier transform infrared spectrophotometry ,  C-H bond ,  polarizability ,  high frequency discharge ,  infrared absorption spectrum ,  FT-IR spectrum ,  *boron carbon nitride

JST classification (2)： Thin films of other inorganic compounds  (BK14060A) ,  Dielectrics in general  (BM05010F)

Substance index (1)： Tris(dimethylamino)borane

Terms in the title (8)： ホウ素 ,  プラズマ支援化学蒸着 ,  堆積 ,  水素 ,  窒化ホウ素 ,  炭素膜 ,  誘電特性 ,  高周波電力