Art

J-GLOBAL ID：201202252461580692   Reference number：12A1439731

Towards the Optical Inspection Sensitivity Optimization of EUV Masks and EUVL-Exposed Wafers

EUVマスクとEUVL露光ウエハの光学的検査感度最適化に向けて

Author (22)： OKOROANYANWU U. (GLOBALFOUNDRIES, Dresden, DEU) ,  OKOROANYANWU U. (AMTC) ,  HEUMANN J. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  ZHU X. (GLOBALFOUNDRIES, NY, USA) ,  CLIFFORD C.H. (GLOBALFOUNDRIES, CA, USA) ,  JIANG F. (GLOBALFOUNDRIES, CA, USA) ,  MANGAT P. (GLOBALFOUNDRIES, NY, USA) ,  GHASKADAVI R. (KLA-Tencor, NY, USA) ,  MOHN E. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  MOSES R. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  WOOD O. (GLOBALFOUNDRIES, NY, USA) ,  ROLFF H. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  SCHEDEL T. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  CANTRELL R. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  NESLADEK P. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  LICAUSI N. (GLOBALFOUNDRIES, NY, USA) ,  CAI X. (GLOBALFOUNDRIES, NY, USA) ,  TAYLOR W. (GLOBALFOUNDRIES, NY, USA) ,  SCHEFSKE J. (GLOBALFOUNDRIES, NY, USA) ,  SCHEFSKE J. (IMEC) ,  BENDER M. (Advanced Mask Technol. Center(AMTC) GmbH & Co. KG, Dresden, DEU) ,  SCHMIDT N. (KLA-Tencor, Dresden, DEU)
Material： Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)
Volume： 8352  Page： 83520V.1-83520V.14  Publication year： 2012 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)

Thesaurus term： semiconductor process ,  *photolithography ,  extreme ultraviolet ,  mask ,  defect ,  simulation ,  waveform analysis ,  absorber ,  antireflection film ,  testing device ,  optimization
Semi thesaurus term： EUV ,  *EUV mask ,  EUV lithography ,  absorber ,  mask blanks ,  phase defect ,  *inspection tool

JST classification (1)： Manufacturing technology of solid-state devices  (NC03030V)

Terms in the title (8)： EUVマスク ,  EUVL ,  露光 ,  ウエハ ,  光学 ,  検査 ,  感度 ,  最適化