Art
J-GLOBAL ID：201202275331920521   Reference number：12A0649234

レジスト高分子の放射線化学

Author (2)：
OKAMOTO KAZUMASA

About OKAMOTO KAZUMASA

(北大 大学院)

About 北大 大学院

, 
SUMIYOSHI TAKASHI

About SUMIYOSHI TAKASHI

(北大 大学院)

About 北大 大学院


Material：
日本化学会講演予稿集  (日本化学会春季年会講演予稿集)

About 日本化学会講演予稿集


Volume： 92nd  Issue： 1  Page： 59  Publication year： Mar. 09, 2012 
JST Material Number： S0493A  ISSN： 0285-7626  Document type： Proceedings
Article type： 短報  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
Thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
photolithography

About photolithography

, 
vacuum ultraviolet radiation

About vacuum ultraviolet radiation

, 
photoresist

About photoresist

, 
*reaction mechanism

About reaction mechanism

, 
photochemical reaction

About photochemical reaction

, 
*Pulse Radiolysis

About Pulse Radiolysis

, 
*EUV resist

About EUV resist


Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
EUV lithography

About EUV lithography


JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
レジスト

About レジスト

, 
高分子

About 高分子

, 
放射線化学

About 放射線化学


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