Rchr
J-GLOBAL ID：200901074840585796
Update date: Oct. 31, 2024
Okamoto Kazumasa
Okamoto Kazumasa
Affiliation and department：
Homepage URL (2)：
http://www.sanken.osaka-u.ac.jp/labs/bms/
,
http://www.eng.hokudai.ac.jp/labo/qsre/QSciEngjp/
Research field (4)：
Quantum beam science
, Basic physical chemistry
, Nanomaterials
, Nuclear engineering
Research theme for competitive and other funds (11)：
- 2022 - 2025 放射線プロセスによる位置制御可能なケミカルフリー水中酸化物結晶生成法の確立
- 2020 - 2023 ガルバニック水中結晶光合成の学理構築に基づく機能性3次元ヘテロナノ構造体創製
- 2018 - 2023 Development of single nano materials based on quantum beam and data science
- 2019 - 2022 Elucidation of deprotonation induced mechanism in nano-and microfabrication process using ionizing radiations and its applications
- 2015 - 2018 Influence of charge delocalization in nanofabrication induced by ionizing radiations
- 2014 - 2017 Development of self-aligned nano-carbon biosensors using glycan for the highly pathogenic avian influenza virus
- 2013 - 2016 Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography
- 2012 - 2015 Elucidation of local ionization in ultra-thin polymer films and its application
- 2010 - 2011 Elucidation of Ionization Dynamics of Polymers for Nanofabrication by Using Quantum Beam
- 2007 - 2008 Elucidation of Molecular Dynamicsand Reaction Mechanism of ResistMaterials for the Control of Nanosize-roughness
- 2005 - 2008 Femtosecond Pulse Radiolysis Study on Nanoscale Time Space Reaction Process
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Papers (101)：
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Kazumasa Okamoto, Yusa Muroya, Takahiro Kozawa. Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group. Scientific reports. 2024. 14. 1. 16729-16729
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Kouta Iwane, Hiroto Kudo, Kazumasa Okamoto, Takahiro Kozawa. Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity. Journal of Photopolymer Science and Technology. 2024. 37. 3. 287-292
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Riku Akabane, Kazumasa Okamoto, Takahiro Kozawa, Hiroto Kudo. Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity. Journal of Photopolymer Science and Technology. 2024. 37. 3. 293-298
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Yoshika Tsuda, Yusa Muroya, Kazumasa Okamoto, Takahiro KOZAWA, Takuya Ikeda, Yoshitaka Komuro. Effects of substituents in triphenylsulfonium cation on its radiation-induced decomposition and dissolution kinetics of chemically amplified resists. Japanese Journal of Applied Physics. 2024
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Hiroki Yamamoto, Yuko Tsutsui Ito, Kazumasa Okamoto, Shuhei Shimoda, Takahiro KOZAWA. Study on resist performance of inorganic-organic resist materials for EUV and EB lithography. Japanese Journal of Applied Physics. 2024
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MISC (192)：
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岡本一将, 山本洋揮, 山本洋揮, 古澤孝弘. Approach to Delocalization of Positive Charge on Polystyrene by Pulse Radiolysis and Simulation. 日本原子力学会春の年会予稿集(CD-ROM). 2022. 2022
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塚村順平, 高橋優樹, 張麗華, ジェーム メルバート, 岡本一将, 渡辺精一. G-SPSCを用いた欠陥制御による色調表面パターニング. 日本金属学会講演大会(Web). 2021. 169th
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村上誉幸, 石割文崇, 岡本一将, 古澤孝弘, 佐伯昭紀. Electron Beam Irradiation Effect on Lead Halide Perovskite Solar Cell. 応用物理学会春季学術講演会講演予稿集(CD-ROM). 2021. 68th
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前田尚輝, 岡本一将, 井狩優太, 誉田明宏, 古澤孝弘, 田村貴央. Dependence of chemically amplified resist performance on film thickness under electron beam irradiation. 日本原子力学会春の年会予稿集(CD-ROM). 2020. 2020
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Y. Ikari, K. Okamoto, N. Maeda, A. Konda, T. Kozawa, T. Tamura. Mechanism of resist heating effect in chemically amplified resist. Proceedings of SPIE - The International Society for Optical Engineering. 2020. 11326
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Patents (6)：
Professional career (1)：
- Doctor of Engineering (Osaka University)
Committee career (8)：
Association Membership(s) (5)：
日本原子力学会
, 応用物理学会
, 日本化学会
, 日本放射線化学会
, SPIE(The International Society for Optical Engineering)
