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J-GLOBAL ID:201302201012851995   Reference number:13A0702090

Spontaneous formation of aluminum germanate on Ge(100) by atomic layer deposition with trimethylaluminum and microwave-generated atomic oxygen

トリメチルアルミニウムとマイクロ波発生原子状酸素の原子層蒸着によるGe(100)上のゲルマニウム酸アルミニウムの自発的形成
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Volume: 102  Issue: 13  Page: 132904-132904-4  Publication year: Apr. 01, 2013 
JST Material Number: H0613A  ISSN: 0003-6951  CODEN: APPLAB  Document type: Article
Article type: 短報  Country of issue: United States (USA)  Language: ENGLISH (EN)
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Metal-insulator-semiconductor structures 
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