Art

J-GLOBAL ID：201302243150977830   Reference number：13A0409367

Very low drift and high sensitivity of nanocrystal-TiO₂ sensing membrane on pH-ISFET fabricated by CMOS compatible process

CMOS両立プロセスにより作製したpH-ISFET上のナノ結晶-TiO₂センシング膜の超低ドリフト及び高感度

Author (17)： BUNJONGPRU W. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  BUNJONGPRU W. (Coll. of Nanotechnology, King Mongkut’s Inst. of Technol. Ladkrabang, Bangkok 10520, THA) ,  SUNGTHONG A. (Rajanagarindra Rajabhat Univ., Chachoengsao 24000, THA) ,  PORNTHEERAPHAT S. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  PORNTHEERAPHAT S. (Photonics Technol. Lab. (PTL), NECTEC, NSTDA, Thailand Sci. Park, Patumthani 12120, THA) ,  RAYANASUKHA Y. (Coll. of Nanotechnology, King Mongkut’s Inst. of Technol. Ladkrabang, Bangkok 10520, THA) ,  PANKIEW A. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  PANKIEW A. (Coll. of Nanotechnology, King Mongkut’s Inst. of Technol. Ladkrabang, Bangkok 10520, THA) ,  JEAMSAKSIRI W. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  SRISUWAN A. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  CHAISRIRATANAKUL W. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  CHAOWICHARAT E. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  KLUNNGIEN N. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  HRUANUN C. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  POYAI A. (Thai Microelectronics Center (TMEC), Chachoengsao 24000, THA) ,  NUKEAW J. (Coll. of Nanotechnology, King Mongkut’s Inst. of Technol. Ladkrabang, Bangkok 10520, THA) ,  NUKEAW J. (ThEP Center, CHE, 328 Si-Ayutthaya Rd., Bangkok 10400, THA)
Material： Applied Surface Science  (Appl Surf Sci)
Volume： 267  Page： 206-211  Publication year： Feb. 15, 2013 
JST Material Number： B0707B  ISSN： 0169-4332  Document type： Article
Article type： 原著論文  Country of issue： Netherlands (NLD)  Language： ENGLISH (EN)

Thesaurus term： *ISFET ,  *semiconductor process ,  *nano crystal ,  *titanium oxide ,  compound semiconductor ,  semiconductor thin film ,  *pH sensor ,  reactive sputtering ,  magnetron sputtering ,  *sputtered deposition ,  *annealing(heat treatment) ,  crystallization ,  silicon dioxide ,  silicon ,  electrolyte ,  device structure
Semi thesaurus term： CMOS process ,  *titanium dioxide

JST classification (4)： Analytical instruments  (CC02020S) ,  Transistors  (NC03070N) ,  Oxide thin films  (BK14050P) ,  Other contacts of semiconductors  (BM03086O)

Terms in the title (10)： CMOS ,  プロセス ,  作製 ,  pH ,  ISFET ,  ナノ結晶 ,  TiO2 ,  センシング ,  ドリフト ,  高感度